New materials conform to the shape of your face


New polyurethane material intercepts pollen


3-D mesh structure based on porous filter technology

Blocks 99 % of pollen *

<filter performance>

High air permeability makes it

easy to breathe

What is porous filter technology?

Two proprietary technologies create porous polyurethane material (open microscopic holes).
These technologies enable high performance filtration.

1. Cell control technology

Controls the cells that make up the polyurethane material so that they form the ideal density and size
for trapping pollen-sized particles. In addition, using a 3-D mesh structure allows 99% of pollen to be blocked*.

2. Technology to remove polyurethane's characteristic membrane

Complete removal of membrane inhibiting air permeability (cell membrane).
This makes possible incredible air permeability not normally seen in polyurethane material.

Soft stretchy polyurethane material

Fits snugly to face, avoiding

gaps that allow pollen to slip by

Comfortable to wear for long periods of

time without hurting ears

- Fits snugly to contours of face 

- Simple and clean design

- Fits snugly without leaving space around jaw and cheers

- Loops gently around ears

- Fits snugly to contours of nose

Con be washed and reused reused repeatedly

Blocks 99 % of pollen*

even after being washed 3 times,for

excellent economy

<filter performance>

Wash by hand then dry out of direct sunlight.

Blocks  pollen

and cuts UV rays.

PITTA MASK not only blocks pollen, but effectively cuts harmful ultraviolet rays.
PITTA MASK GRAY has a UV Protection Rate of 98%* and a UPF of 50+*.
And all our color masks have a high UV Protection Rate/UPF.

UV Protection Rate: Ultraviolet ray shielding rate
UPF: Ultraviolet ray protection factor rating

* KAKEN TEST CENTER General Incorporated Foundation